ISSN: 0973-7510

E-ISSN: 2581-690X

Zan Wang1, Xin Wang2 , YaYu Wang3 and Xiang Li4
1The first hospital of Jilin University, Changchun, 130021, P.R. China.
2School of Materials Science and Engineering, Key Laboratory of Mobile Materials, MOE, Jilin University, Changchun, 130012, P.R. China.
J Pure Appl Microbiol. 2013;7(Spl. Edn.: April):221-226
© The Author(s). 2013
Received: 03/03/2013 | Accepted: 14/04/2013 | Published: 30/04/2013
Abstract

Nickel-carbon thin films have been deposited on silicon substrate in the CH4/Air/H2 atmosphere by plasma-enhanced chemical vapor deposition. Scanning electron microscopy, transmission electron microscopy, high resolution transmission electron microscopy and Raman spectroscopy were employed to investigate the morphology and microstructure of the samples. The results showed that graphitic carbon encapsulated nickel, nickel nanoparticles embedded in few-layer graphene, and entangled few-layer graphene nanoribbons were synthesized, respectively, corresponding to different diameter of nickel particles. The growth mechanism of the different microstructures has been discussed.

Keywords

Ni-C, graphene, plasma-enhanced chemical vapor deposition

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